发明名称 STAGE SYSTEM AND ALIGNER
摘要 <p>PROBLEM TO BE SOLVED: To provide a stage system in which deformation of a stage caused by gas acting through gas bearings can be suppressed, and an aligner in which highly accurate alignment can be effected using that stage system. SOLUTION: A reticle stage 2 comprises a fine motion stage 18, a rough motion stage 16 having an upper surface 16a facing the lower surface 18a of the fine motion stage 18, a plurality of air bearings 60 disposed at a plurality of positions on the lower surface 18a and having a part 62 for blowing gas toward the upper surface 16a, and vacuum sections 66 disposed between respective air bearings 60 and discharging gas in the space between the lower surface 18a and the upper surface 16a.</p>
申请公布号 JP2002217082(A) 申请公布日期 2002.08.02
申请号 JP20010005667 申请日期 2001.01.12
申请人 NIKON CORP 发明人 HORIKAWA HIROTO
分类号 G03F9/00;F16C32/06;G03F7/20;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G03F9/00
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