发明名称 |
EQUIPMENT AND METHOD OF PLASMA TREATMENT |
摘要 |
PROBLEM TO BE SOLVED: To obtain plasma distribution suitable for treatment even when a plasma forming condition is changed. SOLUTION: The equipment provides a mounting stand 22 for placing a body to be treated 21, a treatment container 11 having an opening and containing the mounting stand 22 therein, an antenna 30 for supplying electromagnetic field F in a treatment container 11 through a dielectric member 13 placed out of the treatment container 11 facing to the dielectric member 13, and a means for regulating an antenna position for changing the distance L between the antenna 30 and the dielectric member 13. |
申请公布号 |
JP2002217173(A) |
申请公布日期 |
2002.08.02 |
申请号 |
JP20010010886 |
申请日期 |
2001.01.18 |
申请人 |
TOKYO ELECTRON LTD;YASAKA YASUNORI |
发明人 |
ISHII NOBUO;YASAKA YASUNORI |
分类号 |
H05H1/46;B01J19/08;C23C16/507;H01L21/205;H01L21/302;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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