发明名称 EQUIPMENT AND METHOD OF PLASMA TREATMENT
摘要 PROBLEM TO BE SOLVED: To obtain plasma distribution suitable for treatment even when a plasma forming condition is changed. SOLUTION: The equipment provides a mounting stand 22 for placing a body to be treated 21, a treatment container 11 having an opening and containing the mounting stand 22 therein, an antenna 30 for supplying electromagnetic field F in a treatment container 11 through a dielectric member 13 placed out of the treatment container 11 facing to the dielectric member 13, and a means for regulating an antenna position for changing the distance L between the antenna 30 and the dielectric member 13.
申请公布号 JP2002217173(A) 申请公布日期 2002.08.02
申请号 JP20010010886 申请日期 2001.01.18
申请人 TOKYO ELECTRON LTD;YASAKA YASUNORI 发明人 ISHII NOBUO;YASAKA YASUNORI
分类号 H05H1/46;B01J19/08;C23C16/507;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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