| 摘要 |
<p>PROBLEM TO BE SOLVED: To reduce and eliminate regions in which light is not condensed. SOLUTION: A resin layer used to form the microlens is formed on a semiconductor substrate. A photoresist layer is formed on the resin layer. The photoresist layer is patterned by photolithography. Many photoresist patterns with a rectangular plan view are formed which are arranged close to each other in a matrix shape. As a mask used for the photolithography, a mask 14 in which respective corners 18 in respective mask patterns 16 corresponding respectively to the respective photoresist patterns are provided with subalignment patterns 20 extended outward in diagonal directions, is used. The photoresist patterns are thermally melted so as to be changed to convex microlens patterns for transfer, their whole face is dry-etched, and the microlens patterns for transfer are transferred to form the microlens.</p> |
