MASK FOR ELECTRON BEAM EXPOSURE AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a mask for electron beam exposure having a highly accurate ultrafine pattern. SOLUTION: The mask for electron beam exposure comprises an electron shield film having a mask part 10 where a specified pattern to be transferred is formed, a film for supporting the electron shield film having through holes corresponding to the specified pattern, and a frame for supporting the supporting film on the outside of the mask part 10 wherein the electron shield film comprises a tantalum film 4 and the supporting film comprises a diamond film 3.