发明名称 SUBSTRATE AND ITS MANUFACTURING METHOD AS WELL AS DISPLAY APPARATUS AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To overcome an electrical, optical problem caused by surface surges or scars on a glass substrate, by chemically and mechanically polishing an insulation film that is arranged so as to contact with the glass substrate and have almost the same refraction factor as that of the glass substrate. SOLUTION: By polishing the insulation film that is arranged so as to contact with the glass substrate and have almost the same refraction factor with that of the glass substrate, surges or scars on a glass substrate can be reduced. Hereby the occurrence of an interference band can be controlled. Additionally, if TFTs are formed on the insulation film and the interlayer film of the TFTs is polished, the fluctuation of the interlayer film thickness caused by the surge of the glass substrate can be suppressed.</p>
申请公布号 JP2002217150(A) 申请公布日期 2002.08.02
申请号 JP20010014096 申请日期 2001.01.23
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 HIRAKATA YOSHIHARU
分类号 G02F1/1333;C03C17/245;C03C19/00;G02F1/1368;G09F9/30;H01L21/20;H01L21/304;H01L21/768;H01L29/786;(IPC1-7):H01L21/304;G02F1/136;G02F1/133 主分类号 G02F1/1333
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