发明名称 SYSTEM AND METHOD FOR IRRADIATING ELECTRON BEAM
摘要 PROBLEM TO BE SOLVED: To obtain an electron beam irradiation system for machining a work by irradiating it with an electron beam in which the accuracy of irradiating position is enhanced. SOLUTION: Depending on the outputs from a plurality of magnetic detectors 41-46 disposed in the vicinity of an electron beam generator 25 or in a vacuum tank 10, an electron beam deflection electrode 31 is driven to deflect an electron beam in the direction for canceling deflection of electron beam due to variation of magnetic field thus correcting positional shift of an electron beam spot focused on an original board 21 due to variation of magnetic field.
申请公布号 JP2002217086(A) 申请公布日期 2002.08.02
申请号 JP20010008330 申请日期 2001.01.16
申请人 SONY CORP 发明人 MUKAI NOBUHIKO;KAWASE HIROSHI
分类号 G03F7/20;G11B7/26;H01J37/09;H01J37/147;H01J37/21;H01J37/30;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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