MATCHING CIRCUIT, AND METHOD AND APPARATUS FOR PLASMA TREATMENT

摘要

PROBLEM TO BE SOLVED: To provide a matching circuit, and a method and an apparatus of a plasma treatment with a wide matching range. SOLUTION: The inside of a vacuum container 1 is held under prescribed pressure, while a given gas is fed from a gas supply apparatus 2 into the vacuum container 1 and evacuated by a turbo-molecular pump 3 as an evacuation unit. The plasma is generated in the container 1 by supplying high-frequency power of frequency f=100 MHz from a high-frequency power source 4 to an antenna 5 projected in the vacuum chamber. A method of the plasma treatment in a wide adjustment range is realized by using a copper plate as inductance in a matching circuit when a plasma treatment is carried out to a substrate 7 mounted on a substrate electrode 6.