ELECTRON BEAM APPARATUS, METHOD FOR DETECTING DISPLACEMENT OF AXIS OF ELECTRON BEAM AND METHOD FOR MANUFACTURING DEVICE USING ELECTRON BEAM APPARATUS

摘要

PROBLEM TO BE SOLVED: To accurately detect an incident position and an incident angle of a beam. SOLUTION: An electron beam radiated from a radiating means 1 irradiates a sample through a deflecting means 4 and the first and second masks. When a displacement is detected, an opening of the first mask is scanned by the deflecting means 4 and the beam limited by the first mask irradiates the second mask 3. When the incident angle and the incident position are displaced, a beam region which is a part of the beam scanned by the deflecting means 4 and irradiates the second mask is eccentric, and an eccentric state is detected by an electron detecting means 5 and an axis displacement detecting means 6. When an apparatus uses multi-beam, the first mask is disposed in an opening for determining the number of openings of an optical system.