发明名称 EXCIMER LASER CONTROL DEVICE AND EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide excimer laser device which can minimize variations in the exposure by eliminating a spike-like pattern of pulse energy, and perform exposure with a less number of pulses than a conventional laser. SOLUTION: In an excimer laser device capable of performing burst-mode oscillation, the energy amount of pulses oscillated from the excimer laser device is detected, the relationship between a discharge voltage in each pulse and the amount of energy from the start of the oscillation state is obtained based on the detection result, and the discharge voltage is controlled based on the obtained relationship, so that the energy amount in each pulse during the oscillation state is almost constant.
申请公布号 JP2002217099(A) 申请公布日期 2002.08.02
申请号 JP20010358723 申请日期 2001.11.26
申请人 NIKON CORP 发明人 MIYAJI AKIRA;ATSUMI SHINOBU
分类号 G03F7/20;H01L21/027;H01S3/134;H01S3/225;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利