发明名称 METHOD FOR MANUFACTURING LAMINATE AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a laminate which can be applied to the manufacture of the laminate containing various substrates and members, by solving the problem that e.g. a substrate on which the laminate is arranged or a member which is contained in the laminate is limited, because a process to be performed under severe conditions such as a high-temperature treatment or the like is contained in a conventional method for manufacturing the laminate such as a semiconductor device or the like used to sequentially form a layer or a region on a substrate. SOLUTION: A first isolation layer, an intermediate layer and a body to be transferred are formed sequentially on a first substrate. The body to be transferred and a second isolation layer which is formed on a second substrate are bonded via a first bonding layer. The first isolation layer is irradiated with light, an exfoliation in the first isolation layer is induced, and the first substrate is detached. A third substrate and the intermediate layer are bonded via a second bonding layer. A heating operation is performed, an exfoliation in the second isolation layer is induced, and the second substrate is detached.
申请公布号 JP2002217391(A) 申请公布日期 2002.08.02
申请号 JP20010014352 申请日期 2001.01.23
申请人 SEIKO EPSON CORP 发明人 UTSUNOMIYA SUMIO
分类号 H01L27/12;H01L21/02;H01L21/336;H01L29/786;(IPC1-7):H01L27/12 主分类号 H01L27/12
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