发明名称 Photolithographic method and system for efficient mask usage in manufacturing DNA arrays
摘要 Systems, methods, and products are described for synthesizing probe arrays of polymers. A mask is used that includes reticle areas, each of which includes a number of reticles associated with a same synthesis area on a substrate. A method includes (a) aligning the mask with respect to the substrate so that a first reticle of a first reticle area is aligned with a first synthesis area and so that a second reticle of the first reticle area is aligned with a first discard area on the substrate; (b) coupling monomers on the first synthesis area at locations determined by the first reticle; (c) re-aligning the mask with respect to the substrate so that the second reticle is aligned with the first synthesis area; and (d) coupling monomers on the first synthesis area at locations determined by the second reticle. The monomers may be, for example, nucleotides, amino acids or saccharides.
申请公布号 US2002102564(A1) 申请公布日期 2002.08.01
申请号 US20010824931 申请日期 2001.04.03
申请人 MITTMANN MICHAEL P.;HUBBELL EARL A. 发明人 MITTMANN MICHAEL P.;HUBBELL EARL A.
分类号 B01J19/00;C40B40/06;C40B60/14;G01N33/543;G03F1/00;G03F1/14;G06F19/20;(IPC1-7):C12Q1/68;G01N33/53;G06F19/00;G01N33/48;G01N33/50 主分类号 B01J19/00
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