A process for the decomposition and removal of one or more fluorine containing compounds from a first gaseous mixture comprising the one or more fluorine containing compounds and water vapour, which process comprises the stages of: (i) contacting the first gaseous mixture with a catalyst comprising an aluminium based material to produce a second gaseous mixture comprising hydrogen fluoride and carbon oxides; and (ii) removing the hydrogen fluoride from the second gaseous mixture to produce a third gaseous mixture, which is substantially free of hydrogen fluoride.
申请公布号
WO02058824(A1)
申请公布日期
2002.08.01
申请号
WO2002GB00264
申请日期
2002.01.24
申请人
INEOS FLUOR HOLDINGS LIMITED;DRAPER, LEE, COLIN;SCOTT, JOHN, DAVID