发明名称 Substrate processing using a member comprising an oxide of a group IIIB metal
摘要 An erosion resistant member that may be used in the processing of a substrate in a plasma of a processing gas, comprises at least a portion that may be exposed to the plasma of the processing gas and that contains more than about 3% by weight of an oxide of a Group IIIB metal. The portion may also further contain a ceramic compound selected from silicon carbide, silicon nitride, boron carbide, boron nitride, aluminum nitride, aluminum oxide, and mixtures thereof.
申请公布号 US2002100554(A1) 申请公布日期 2002.08.01
申请号 US20010083738 申请日期 2001.10.24
申请人 APPLIED MATERIALS, INC. 发明人 HAN NIANCI;SHIH HONG;YUAN JIE;LU DANNY;MA DIANA
分类号 C04B35/50;B01J19/08;C23C14/00;C23C16/44;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23F1/00 主分类号 C04B35/50
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