发明名称 Process for producing a photoelectric conversion device
摘要 A catalyst element remaining in a first semiconductor film subjected to a first heat treatment (crystallization) is moved and concentrated/collected by subjecting a second semiconductor film which is formed on the first semiconductor film and contains a rare gas element to a second heat treatment. That is, the rare gas element is incorporated into the second semiconductor film to generate a strain field as a gettering site.
申请公布号 US2002102764(A1) 申请公布日期 2002.08.01
申请号 US20020056108 申请日期 2002.01.28
申请人 YAMAZAKI SHUNPEI;ARAI YASUYUKI 发明人 YAMAZAKI SHUNPEI;ARAI YASUYUKI
分类号 H01L27/14;C30B1/02;H01L21/20;H01L31/04;H01L31/18;H01L31/20;(IPC1-7):H01L21/00;C30B1/00;H01L21/36 主分类号 H01L27/14
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