APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION,申请号KR1020027007734-传众专利搜索

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发明名称	APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION
摘要
申请公布号	KR20020063234(A)	申请公布日期	2002.08.01
申请号	KR1020027007734	申请日期	2002.06.17
申请人		发明人
分类号	H01L21/20	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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