| 摘要 |
The invention provides an efficient process by which trace impurities are removed from matrix hydride, inert gases and non-reactive gases, thus decreasing the concentration of the trace gases by a factor of 100-to-10,000, and more specifically to part-per-billion (ppb) or part-per-trillion (ppt) levels. Hydride gases such as ammonia, phosphine and arsine, and inert gases such as nitrogen, helium, hydrogen, and argon are purified by removing trace contaminants such as silane (SiH4), hydrogen sulfide (H2S) and germane (GeH4), along with traces of moisture. The gas purifier materials of this invention include thermally activated aluminas from organic sources, thermally activated modified organic alumina materials, and thermally activated modified aluminas from an inorganic source. The thermally activated alumina materials of this invention are activated by heating the alumina material at a temperature between about 200-1000°C. in an inert atmosphere and maintaining the activated material in an inert atmosphere.
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