| 摘要 |
For phase-shifting microlithography, a method of assigning phase to a set of shifter polygons [101] in a mask layer separated by a set of target features [102] includes assigning a first phase to a first shifter polygon [110, 140], identifying a set of target features that touch the first shifter polygon [120, 130], and assigning a second phase to all shifter polygons in the set that touch the set of target features in contact with the first shifter polygon [145, 150, 155]. The set of shifter polygons and the set of target features are separated into aggregates that are spatially isolated from each other such that the phase assignment in one aggregate [191] does not affect the phase assignments in other aggregates [192]. |
