发明名称 |
THIN FILM DEVICE PROVIDED WITH COATING FILM, LIQUID CRYSTAL PANEL AND ELECTRONIC DEVICE, AND METHOD FOR MAKING THE THIN FILM DEVICE |
摘要 |
Any one of an insulating film forming a TFT, a silicon film and a conductive film is formed by applying a solution and annealing it. In a spin coater (102), a coating solution containing a thin film component which is supplied from a solution storage section (105) is spin-coated onto a substrate. The substrate after coating the coating solution is annealed in an annealing section (103) to form a coating film on the substrate. Additional laser annealing improves one of film characteristics, i.e., crystallinity, density and adhesiveness. Application of the coating solution or a resist by an ink jet process increases utilization of the solution and permits forming a patterned coating film. Because a thin film device in accordance with the present invention is inexpensive and has a high throughput, TFT production by a production system having high utilization of the coating solution drastically reduces initial investment and production cost of a liquid crystal display device.
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申请公布号 |
US2002100908(A1) |
申请公布日期 |
2002.08.01 |
申请号 |
US19990325567 |
申请日期 |
1999.06.04 |
申请人 |
YUDASAKA ICHIO;SHIMODA TATSUYA;KANBE SADAO;MIYAZAWA WAKAO |
发明人 |
YUDASAKA ICHIO;SHIMODA TATSUYA;KANBE SADAO;MIYAZAWA WAKAO |
分类号 |
G02F1/1368;G02F1/1333;G02F1/1362;H01L21/20;H01L21/205;H01L21/225;H01L21/288;H01L21/31;H01L21/3205;H01L21/336;H01L21/768;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):H01L31/037 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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