| 发明名称 |
Linear drive system for use in a plasma processing system |
| 摘要 |
A plasma processing system for processing a substrate is disclosed. The system includes a process component capable of effecting a plasma inside a process chamber. The system also includes a gear drive assembly for moving the process component in a linear direction during processing of the substrate.
|
| 申请公布号 |
US2002100555(A1) |
申请公布日期 |
2002.08.01 |
| 申请号 |
US20010012265 |
申请日期 |
2001.11.05 |
| 申请人 |
LAM RESEARCH |
发明人 |
HAO FANGLI;DAWSON KEITH;LENZ ERIC H. |
| 分类号 |
H05H1/46;C23C16/509;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):H01L21/306;C23F1/00;C23C16/00 |
主分类号 |
H05H1/46 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
