发明名称 RADIATION SENSITIVE POSITIVE TYPE RESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a chemical amplification type radiation sensitive positive type resist composition excellent in various functions such as resolving power. SOLUTION: The radiation sensitive positive type resist composition contains a resin having a rate of dissolution in an alkali developing solution increased by the action of an acid, a compound which generates the acid when irradiated with active light or radiation, a solvent and a compound having a bond which is cleaved by irradiation with the active light or radiation to generate a basic compound and an ionic compound.
申请公布号 JP2002214770(A) 申请公布日期 2002.07.31
申请号 JP20010010298 申请日期 2001.01.18
申请人 FUJI PHOTO FILM CO LTD 发明人 TAKAHASHI AKIRA;KAWABE YASUMASA;YASUNAMI SHOICHIRO;YAMANAKA TSUKASA
分类号 G03F7/004;C08K5/00;C08L101/00;G03F7/039;H01L21/027 主分类号 G03F7/004
代理机构 代理人
主权项
地址