发明名称 |
RADIATION SENSITIVE POSITIVE TYPE RESIST COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive positive type resist composition excellent in various functions such as DOF(degree of freedom) of focus and resolving power and excellent also in shelf stability. SOLUTION: The radiation sensitive positive type resist composition contains a resin having a rate of dissolution in an alkali developing solution increased by the action of an acid, a compound which generates the acid when irradiated with active light or radiation, a solvent and a compound having a bond which is cleaved under heat to separate two or more components including a radical species and/or an ionic compound. |
申请公布号 |
JP2002214768(A) |
申请公布日期 |
2002.07.31 |
申请号 |
JP20010010296 |
申请日期 |
2001.01.18 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
TAKAHASHI AKIRA;KAWABE YASUMASA;YASUNAMI SHOICHIRO;YAMANAKA TSUKASA |
分类号 |
G03F7/004;C08K5/00;C08L101/00;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|