| 摘要 |
PROBLEM TO BE SOLVED: To realize both forming a high quality metal thin film at a low cost and reducing thermal damage to a vacuum deposition device. SOLUTION: In a vacuum deposition method comprising melting and evaporating a raw material accommodated in a crucible 4 by a heating means 6 in a vacuum chamber and forming a film on a substrate 2, plural rods of the raw material 7, connected to each other, are successively delivered in the direction of the crucible 4 at a raw material supplying section 8 and then the rods of the raw material 7 are successively heated and melted by the heating means 6 from the direction of the crucible 4 and further the melted raw material is supplied to the crucible 4.
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