发明名称 |
Process for artificial optical anisotropy creation in optical isotropic semicondustors |
摘要 |
he invention refers to the technology of semiconducting materials and structures and may be used for manufacture of non-linear optical elements. The invention consists in the manufacture on base of semiconductors with cubic lattice of non-linear optical elements with built-in artificial optical anisotropy.The optical isotropic semiconductor crystal is subjected to high-energy ion implantation at an angle, providing for the fulfillment of the phase synchronism conditions with the subsequent electrochemical pickling of the implanted region.Claims: 1Fig.: 4
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申请公布号 |
MD20000119(A) |
申请公布日期 |
2002.07.31 |
申请号 |
MD20000000119 |
申请日期 |
2000.07.17 |
申请人 |
TIGHINEANU ION |
发明人 |
TIGHINEANU ION;DOROGAN VALERIAN;SURUCEANU GRIGORE |
分类号 |
G01N27/20;(IPC1-7):G01N27/20 |
主分类号 |
G01N27/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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