发明名称 Process for artificial optical anisotropy creation in optical isotropic semicondustors
摘要 he invention refers to the technology of semiconducting materials and structures and may be used for manufacture of non-linear optical elements. The invention consists in the manufacture on base of semiconductors with cubic lattice of non-linear optical elements with built-in artificial optical anisotropy.The optical isotropic semiconductor crystal is subjected to high-energy ion implantation at an angle, providing for the fulfillment of the phase synchronism conditions with the subsequent electrochemical pickling of the implanted region.Claims: 1Fig.: 4
申请公布号 MD20000119(A) 申请公布日期 2002.07.31
申请号 MD20000000119 申请日期 2000.07.17
申请人 TIGHINEANU ION 发明人 TIGHINEANU ION;DOROGAN VALERIAN;SURUCEANU GRIGORE
分类号 G01N27/20;(IPC1-7):G01N27/20 主分类号 G01N27/20
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