发明名称 PLASMA TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To substantially eliminate the influence of gaseous fluorine and fluorine radicals and to permit internal observation at a good visual field for a long period of time. SOLUTION: The top surface of a vacuum chamber 12 forming a deposition chamber 10 is provided with a view port 31 for monitoring the inside of the deposition chamber by hermetically fitting a hole section 32 with a window section 33 made of glass. The inside surface side of the window section 33 constituting the view port 31 for monitoring the inside of the deposition chamber is provided with a coating layer 37 formed by vapor deposition of MgF2 having excellent corrosion resistance to the gaseous fluorine and fluorine radicals.
申请公布号 JP2002212733(A) 申请公布日期 2002.07.31
申请号 JP20010013323 申请日期 2001.01.22
申请人 MITSUBISHI HEAVY IND LTD 发明人 SASAGAWA EISHIRO;UENO MOICHI;TAKANO AKIMI
分类号 C23C14/06;C23C16/44;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23C16/44;H01L21/306 主分类号 C23C14/06
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