METHOD FOR PRODUCING STRONTIUM-RUTHENIUM OXIDE SINTERED BODY, AND STRONTIUM-RUTHENIUM OXIDE SINTERED BODY

摘要

PROBLEM TO BE SOLVED: To provide a strontium-ruthenium oxide target which gives good film deposition by a sputtering method. SOLUTION: The high density strontium-ruthenium oxide target having the relative density of >=69% is produced by using the raw material of ruthenium oxide to which metallic ruthenium is added by 0.1 to 4.5 wt.%, or in which metallic ruthenium remains. In the production of the target, sintering is performed in an oxygen atmosphere under the atmospheric pressure of >=2×105 Pa.