发明名称 ELECTROPLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electroplating method making it possible to obtain an aperture grill which has high fineness and is uniform in electronic beam transmittance to directly affect image quality within the plane. SOLUTION: In a method for obtaining the aperture gill and its intermediate body by disposing a cathode and an anode patterned with non-conductor films on their surfaces opposite to each other in an electrolyte and forming metallic films on the cathode surface by the electroplating method, then separating the metallic films from the cathode, it is characterized in that the plating time is so divided as to equalize the average values of the thicknesses of the plating films deposited in each plating time to each other, and after the end of the first plating time, either of the cathode or the anode is rotated within the opposite surfaces thereof and thereafter the electroplating is performed before the end of the next plating time.
申请公布号 JP2002212774(A) 申请公布日期 2002.07.31
申请号 JP20010009425 申请日期 2001.01.17
申请人 SUMITOMO METAL MINING CO LTD 发明人 WATANABE HIROTO;OGASAWARA SHUICHI
分类号 C25D1/08;C25D17/06;C25D21/12;H01J9/14;(IPC1-7):C25D1/08 主分类号 C25D1/08
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