发明名称 POLYACETAL-BASED RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain a polyacetal-based resin composition which can remarkably control the production of formaldehyde. SOLUTION: The polyacetal-based resin composition comprises (A) 100 pts.wt. of a polyacetal resin and (B) 0.001 to 100 pts.wt. of the condensate of a phenol compound with a basic nitrogen-containing compound and an aldehyde compound. The component (B) may be the condensate of phenol with an aminotriazine compound and formaldehyde. The polyacetal-based resin composition may contain an antioxidant, a heat-resistance stabilibizer, a processing stability, a weather (light) stabilizer, a colorant and the like.
申请公布号 JP2002212384(A) 申请公布日期 2002.07.31
申请号 JP20010008069 申请日期 2001.01.16
申请人 POLYPLASTICS CO 发明人 HARASHINA HATSUHIKO
分类号 C08J5/00;C08L59/00;C08L61/14;(IPC1-7):C08L59/00 主分类号 C08J5/00
代理机构 代理人
主权项
地址