SUBSTRATE FOR INSPECTION, METHOD OF MANUFACTURING SUBSTRATE FOR INSPECTION, METHOD OF EVALUATING SUBSTRATE FOR INSPECTION, METHOD OF MANUFACTURING POSITION DETECTOR, POSITION DETECTOR, AND PROJECTION EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate capable of measuring accurately a comatic aberration, a spherical aberration and the amount of a luminous flux vignette. SOLUTION: A phase difference d generated by a step difference between a protruded part and a recessed part of a phase pattern WM in the phase pattern WM of the substrate for the inspection satisfys, for example, (λ/4)(2n+1)-λ/20<=d<=(λ/4)(2n+1)+λ/20 whereinλrepresents the wavelength of illumination light of a position detector, and n is an integer, and a duty ratio (l/s) between the protruded part and a recessed part of the phase pattern WM satisfys 49/51<=l/s<=51/49, a symmetry property between a left side edge angle A and a right side edge angle B in the protruded part of the phase pattern WM satisfys the condition of -20 deg.<=A-B<=20 deg., and the left side edge angle A and the right side edge angle B in the protruded part of the phase pattern WM satisfy the conditions of 70 deg.<=A<=110 deg. and 70 deg.<=B<=110 deg. respectively.