| 摘要 |
PROBLEM TO BE SOLVED: To safely perform a treatment for rendering harmlessness under atmospheric pressure in accordance with the case even when generated gas ingredients are different. SOLUTION: In an exhaust gas treatment apparatus in which an exhaust gas after such a treatment as etching is finished in a semiconductor manufacturing process is decomposed, it is characterized by providing an exhaust gas treating mechanism 5 which is selectively connected with both outlets which are an outlet for removing unreacted gas reaching a treatment process for the gas to be treated and an outlet for removing the treated exhaust gas and the gas to be treated is decomposed under atmospheric pressure and it is exhausted as a harmless gas. |
