发明名称 |
Method for producing optically planar surfaces for micro-electromechanical system devices |
摘要 |
A method for producing optically planar surfaces for micro-electromechanical system devices (MEMS), comprising the steps of: depositing a first layer over a substrate; forming a channel in the first layer wherein the channel has a depth defined by a thickness of the first layer and a width greater than 10 microns; depositing a second layer over the first layer wherein the second layer has a thickness greater than the depth of the channel and is composed of a different material than the first layer; removing the second layer from outside the channel leaving an overlap at the edge of the channel; and polishing the second layer that fills the channel to obtain an optically planar surface for the MEMS device.
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申请公布号 |
US6426237(B2) |
申请公布日期 |
2002.07.30 |
申请号 |
US20010867928 |
申请日期 |
2001.05.30 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
JECH, JR. JOSEPH;LEBENS JOHN A.;BRAZAS, JR. JOHN C.;KOWARZ MAREK W. |
分类号 |
B81C1/00;H01L21/306;(IPC1-7):H01L21/302 |
主分类号 |
B81C1/00 |
代理机构 |
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