WASTE GAS TREATMENT APPARATUS FOR SEMICONDUCTOR PROCESSING

摘要

PROBLEM TO BE SOLVED: To provide a waste gas treatment apparatus capable of efficiently decomposing and detoxifying a waste gas for processing and at the same time saving the plasma ignition electric power and improving the durability while making the entire body compact and economical. SOLUTION: A high frequency discharge pipe 4 for generating plasma for treating a waste gas discharge out of a semiconductor processing chamber 1 is composed of an insulating tubular container 5 having a waste gas introduction inlet 5a and a discharge outlet 5b and an induction coupling type electrode 9 for high frequency electric discharge wound around the outer circumference like a spiral coil. The electrode for high frequency electric discharge is composed of a conductive metal pipe 10 with a large diameter wound like a coil in a manner that cooling water is made to flow in the inside and a high frequency electric power wire 11 with a small diameter arranged between neighboring spiral pitches of the conductive metal pipe 10 with a large diameter, electrically connected with the conductive metal pipe 10 with a large diameter, and wound like a coil.