Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor dram device,申请号AU20020243538-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor dram device
摘要
申请公布号	AU2002243538(A1)	申请公布日期	2002.07.30
申请号	AU20020243538	申请日期	2002.01.15
申请人	MICRON TECHNOLOGY, INC.	发明人	BRENT A. MCCLURE
分类号	H01L21/02;H01L21/768;H01L21/8242;H01L27/108;(IPC1-7):H01L21/824	主分类号	H01L21/02
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Polarized electromagnetic relay

High efficiency auto-modulated welding arc power supply welding arc power supply

Electrostatic transducer

Preparation of high purity trialkyl trithiophosphates

Oxidation process for converting unsaturated tertiary phosphite esters to phosphates

Polyether polynitriles and polyether polyamines

Cationic thiazole dyes and process for manufacturing the same

Centrifugal solids dryer

Anhydrous thixotropic gel sustained release therapeutic compositions and method of preparation

Process of manufacturing pure aluminum oxide from aluminum ores

Adapter for nipple on bath tub spout

Air projected ball game

Cemetery wreath holder

Push-pull cable

Hydraulic control for moving elements of a machine tool

Axial flow turbine with radial temperature gradient

Illuminating control apparatus

Production of n, n'-di(1-methylalkylidene)-p-phenylenediamine

Device for controlling engine and transmission