发明名称 Low vacuum vapor process for producing superconductor articles with epitaxial layers
摘要 A method for fabricating superconductor articles with an epitaxial layer is described. The method can be performed under conditions of relatively high pressure and low substrate surface temperature. The resulting epitaxial layers can demonstrate various advantageous features, including low pore density and/or inclusions with small average particle size diameter.
申请公布号 US6426320(B1) 申请公布日期 2002.07.30
申请号 US19990474519 申请日期 1999.12.29
申请人 AMERICAN SUPERCONDUCTORS CORPORATION 发明人 FRITZEMEIER LESLIE G.;BUCZEK DAVID M.
分类号 C04B35/00;C30B23/02;C30B25/02;H01L39/24;(IPC1-7):C30B25/14 主分类号 C04B35/00
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