| 摘要 |
Disclosed is a pupil aperture, and method for making the pupil aperture for use in a photolithography scanner system. The pupil aperture includes a plate having a set of pole apertures that are radially offset from a reference center point of the plate. The plate further includes a horizontal reference line that intersects the reference center point. The horizontal reference line is used to define a target angle that is between about 15 degrees and about 35 degrees from the horizontal reference line. The target angle defines an off-axis location for each of the set of pole apertures. In a specific aspect of this invention, a set ranging between 3 to 9 pole apertures can be defined in the plate, and their offset from the center point can be selected to be between about 0.3 inches and about 0.9 inches.
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