| 摘要 |
<p>PURPOSE:To accurately measure the imagery characteristics of a projection optical system for a real element pattern of small pitch, without especially improving the resolution of a sensor for position detection of a measurement mark image. CONSTITUTION:A measurement mark 39A on a reticle 29 is formed by arranging periodic patterns 40A to 40C constituted of line-and-space patterns of pitch P2, in the measurement direction, with pitches P1 (P1>P2). When the distortion of the projection optical system is measured, the image of each of the periodic patterns 40A to 40C is treated as the image of a dark line pattern, thereby performing position detection.</p> |
