| 摘要 |
<p>PURPOSE:To simplify the manufacturing process of a reflection type mask and to shorten its manufacturing time. CONSTITUTION:In the title reflection type mask which is composed of an X-ray reflecting multilayer film 1, a non-reflection part on which an absorber 4 made of a material which easily absorbs X-rays, is formed on the multilayer film, and an intermediate layer provided between the multilayer film and the non- reflection part, the intermediate layer 3 is formed of a material which transimits X-rays easily at the wavelength used.</p> |
