| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist material which is produced by using a high- molecular compound of the present invention as a base resin, which is sensitive to high energy rays, and excellent in sensitivity, resolution and etching resistance, and accordingly which is useful in microfabrication with electron beam or far infrared rays. SOLUTION: The high molecular compound having a weight average molecular weight of 1,000-500,000 contains a recurring unit expressed by formula (1-1) or (1-2) (wherein, R1 is H or a 1-6C linear, branched or cyclic alkyl; R2 is H or a 1-15C acyl or alkoxycarbonyl, and a part or the whole of hydrogen atoms existing on the constituting carbon atoms may be substituted with a halogen atom; Y is a 1-15C divalent group and forms a cycling structure together with a group of bonding atoms; and k is 0 or 1, and m is an integer of 0-5). |
