| 摘要 |
<p>PROBLEM TO BE SOLVED: To increase the exposure accuracy and suppress the increase in size of an aligner. SOLUTION: With an object W being moved along the movement surface by driving a stage WST using a driver 11, an exposure beam irradiates the object W to transfer a specified pattern onto the object W. During the exposure, a counter stage (22, etc.), moves in the opposite direction from the stage according to the movement of the stage, so reaction force caused by the driving of the stage is almost completely absorbed. Consequently, there is no vibration nor unbalanced load caused attendant upon the driving of the stage, leading to a very accurate exposure. When the exposure beam is not irradiated, the position of the counter stage is properly corrected so that a movement stroke of the counter stage for the exposure thereafter can be obtained by means of a correction device (45A1, etc.), and thereby the stroke length required for the counter stage can be shortened. Thus, the increase in size of the equipment can be suppressed.</p> |
