发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT WHICH USES THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having mechanical strength, adhesiveness, chemical resistance and flexibility and significantly improved durability against plating and to provide a photosensitive element which uses the above composition. SOLUTION: The photosensitive resin composition and the photosensitive element which uses the above composition contain (A) a binder polymer having carboxyl groups, (B) a photopolymerizable compound having a polymerizable ethylenically unsaturated group in the molecule, (C) a photoinitiator and (D) a dicyandiamide. The component (B) contains a compound expressed by general formula (I) as an essential component. In formula (I), R1 is a bivalent organic group and R2 is expressed by general formula (II). In formula (II), R3 is a hydrogen atom or a methyl group, X is an alkylene oxide group and n is an integer of 1 to 14.
申请公布号 JP2002207292(A) 申请公布日期 2002.07.26
申请号 JP20010333223 申请日期 2001.10.30
申请人 HITACHI CHEM CO LTD 发明人 CHIBA TATSUO;ICHIKAWA TATSUYA
分类号 G03F7/027;C08F2/44;C08F20/36;C08F265/02;C08F290/06;G03F7/004;H05K3/00 主分类号 G03F7/027
代理机构 代理人
主权项
地址
您可能感兴趣的专利