| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treating method and a substrate treatment device, which can securely dry a substrate after a reactive product and an organic matter are removed. SOLUTION: The substrate treatment device is provided with an indexer part 4 for carrying in a cassette 7 where the substrate W is stored, a heat treating part 1 heating the substrate W, a cooling treating part 2 cooling the substrate W, a spin treating part 3 having a spin chuck holding the substrate W so that it can rotate, a removal liquid supply mechanism supply removal liquid to the surface of the substrate W and a pure water supply mechanism supplying pure water to the surface of the substrate W, and a pair of transportation mechanisms 5 and 6 which sequentially transport the substrate W to the spin treating part 3, the heating processing part 1 and the cooling treating part 2 from the indexer part 4. |
