发明名称 METHOD OF MANUFACTURING THIN-FILM STRUCTURE, METHOD AND DEVICE OF MANUFACTURING MAGNETIC HEAD
摘要 PROBLEM TO BE SOLVED: To deal with track a width of 0.2μm or less with high aspect ratio. SOLUTION: A resist pattern 22 is formed on a gap film 20, a magnetic body target 42 is sputtered with a side 23a of the resist pattern 22 as a target to be formed, a film-formed object 48 emitted from the magnetic body target 42 is allowed to fly toward the side 23a and the film-formed particle 48 is allowed to adhere to the resist pattern 22, then, an etching particle 49 is applied to a thin film 30b on the resist pattern 22, thin films 30b and 30c are removed from the resist pattern 22, only a thin film 30a formed on the side 23a is allowed to remain, then the resist pattern 22 is removed, and the thin film 30a that is 0.2μm wide and 1.5μm high is formed as an upper magnetic core tip section 21.
申请公布号 JP2002208531(A) 申请公布日期 2002.07.26
申请号 JP20010003921 申请日期 2001.01.11
申请人 HITACHI LTD 发明人 ICHIMURA SATOSHI;OKADA TOSHIHIRO;KIYONO TOMOYUKI
分类号 C23C14/04;G11B5/31;H01F41/16;H01F41/18;H01F41/34;(IPC1-7):H01F41/16 主分类号 C23C14/04
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