发明名称 |
FOCUSED ION BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To use a compact and inexpensive Penning type inert element ion beam device as one for removing a remnant layer, a crushed layer formed on the surface of a sample by irradiation of focused ion beam device. SOLUTION: A Penning type inert element ion beam device fitted to the focused ion beam device is let to be provided with two motion states of an operation state of coming near a sample and irradiating an inert element beam on it and of a sheltering state of getting away from the sample and not irradiating the inert element ion beam on it.
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申请公布号 |
JP2002208374(A) |
申请公布日期 |
2002.07.26 |
申请号 |
JP20010003831 |
申请日期 |
2001.01.11 |
申请人 |
SEIKO INSTRUMENTS INC;TOPCON DENSHI BEAM SERVICE:KK |
发明人 |
FUJII TOSHIAKI;IWASAKI KOJI;KODAMA TOSHIO;OI MASAMICHI;KAWASHIMA TADASHI;ADACHI YUKIHIRO |
分类号 |
C23C14/48;H01J37/20;H01J37/28;H01J37/317;(IPC1-7):H01J37/317 |
主分类号 |
C23C14/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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