发明名称 FOCUSED ION BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To use a compact and inexpensive Penning type inert element ion beam device as one for removing a remnant layer, a crushed layer formed on the surface of a sample by irradiation of focused ion beam device. SOLUTION: A Penning type inert element ion beam device fitted to the focused ion beam device is let to be provided with two motion states of an operation state of coming near a sample and irradiating an inert element beam on it and of a sheltering state of getting away from the sample and not irradiating the inert element ion beam on it.
申请公布号 JP2002208374(A) 申请公布日期 2002.07.26
申请号 JP20010003831 申请日期 2001.01.11
申请人 SEIKO INSTRUMENTS INC;TOPCON DENSHI BEAM SERVICE:KK 发明人 FUJII TOSHIAKI;IWASAKI KOJI;KODAMA TOSHIO;OI MASAMICHI;KAWASHIMA TADASHI;ADACHI YUKIHIRO
分类号 C23C14/48;H01J37/20;H01J37/28;H01J37/317;(IPC1-7):H01J37/317 主分类号 C23C14/48
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