发明名称 |
MODIFICATION OF MASK LAYOUT DATA TO IMPROVE MASK FIDELITY |
摘要 |
The present invention relates to a system and method of modifying (660) mask layout data (100) to improve the fidelity of mask manufacture. The system and method include determining (645, 650, 655) the difference between the mask layout design (100) and the mask features (20) as written, and generating sizing corrections (160). The sizing corrections (160) can be used to modify (660) the mask layout data (100), and/or stored in a database (170). |
申请公布号 |
WO0198830(A3) |
申请公布日期 |
2002.07.25 |
申请号 |
WO2001US12853 |
申请日期 |
2001.04.19 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
SUBRAMANIAN, RAMKUMAR;PHAN, KHOI, A.;SINGH, BHANWAR;RANGARAJAN, BHARATH |
分类号 |
G03F1/00;G03F1/70;G03F7/20 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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