| 摘要 |
PURPOSE: An apparatus for loading a wafer is provided to reduce contamination of the inside of a loading unit and to minimize recontamination of the wafer caused by the contamination of the loading unit, by exhausting gas byproducts on the wafer through the second door unit. CONSTITUTION: A plurality of slots are positioned at both side surfaces of the loading unit(10), in parallel with each other. A plurality of wafers(W) are loaded into the loading unit, supported by the plurality of wafers. The first door unit(12) is installed on the front surface of the loading unit. The first door unit opens or closes the front surface of the loading unit to unload the wafer stacked in the loading unit. The second door unit(14) connects the inside and the outside of the loading unit, installed in a predetermined portion on the back surface of the loading unit.
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