发明名称 APPARATUS FOR DETECTING ALIGNMENT OF WAFER
摘要 PURPOSE: An apparatus for detecting alignment of a wafer is provided to make the wafer properly settled in a charger and not broken when the charger holds the wafer and to guarantee that the charger can hold the wafer, by aligning a flat zone of the wafer through a sensor. CONSTITUTION: A pair of align rollers(108) rotate on the lower portion of a plurality of wafers(102). The align rollers align the flat zone of the wafers, in parallel with each other and at a regular interval. The first sensor forms a light path at a predetermined distance from the lower portion of the flat zone of the wafer, positioned between the align rollers and composed of a light emitting unit and a light receiving unit. The second sensor forms a light path at a predetermined distance from the lower portion of the flat zone of the wafer, positioned between the align rollers and separated from the first sensor by a predetermined interval, wherein the light path formed by the second sensor is in parallel with the light path formed by the first sensor.
申请公布号 KR20020061711(A) 申请公布日期 2002.07.25
申请号 KR20010002635 申请日期 2001.01.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE, JONG SEON
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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