发明名称 |
DEVICE AND METHOD FOR TREATMENT |
摘要 |
A device and a method for treatment, wherein a first channel (30) is formed in the surface of a first diffusion plate (21) on a gas inlet tube (27) side and a recessed part (32) is formed in the surface thereof on an electrode plate (19) side, the first channel (30) communicates with the recessed part (32) through a plurality of communication ports (31), the first channel (30) and the communication ports (31) form a gas flow passage (L) leading from a gas inlet tube (27) to the recessed part (32), and treatment gas fed from the gas inlet tube (27) is fed diffusely into a hollow part formed between the recessed part (32) and the electrode plate (19) through the gas flow passage (L).
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申请公布号 |
WO02058126(A1) |
申请公布日期 |
2002.07.25 |
申请号 |
WO2002JP00429 |
申请日期 |
2002.01.22 |
申请人 |
TOKYO ELECTRON LIMITED;KATO, YOSHIHIRO;GOTO, TADASHI;YOSHITAKA, HIKARU;AOKI, MAKOTO |
发明人 |
KATO, YOSHIHIRO;GOTO, TADASHI;YOSHITAKA, HIKARU;AOKI, MAKOTO |
分类号 |
C23C16/32;C23C16/34;C23C16/36;C23C16/40;C23C16/44;C23C16/455;H01J37/32;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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