发明名称 DEVICE AND METHOD FOR TREATMENT
摘要 A device and a method for treatment, wherein a first channel (30) is formed in the surface of a first diffusion plate (21) on a gas inlet tube (27) side and a recessed part (32) is formed in the surface thereof on an electrode plate (19) side, the first channel (30) communicates with the recessed part (32) through a plurality of communication ports (31), the first channel (30) and the communication ports (31) form a gas flow passage (L) leading from a gas inlet tube (27) to the recessed part (32), and treatment gas fed from the gas inlet tube (27) is fed diffusely into a hollow part formed between the recessed part (32) and the electrode plate (19) through the gas flow passage (L).
申请公布号 WO02058126(A1) 申请公布日期 2002.07.25
申请号 WO2002JP00429 申请日期 2002.01.22
申请人 TOKYO ELECTRON LIMITED;KATO, YOSHIHIRO;GOTO, TADASHI;YOSHITAKA, HIKARU;AOKI, MAKOTO 发明人 KATO, YOSHIHIRO;GOTO, TADASHI;YOSHITAKA, HIKARU;AOKI, MAKOTO
分类号 C23C16/32;C23C16/34;C23C16/36;C23C16/40;C23C16/44;C23C16/455;H01J37/32;(IPC1-7):H01L21/31 主分类号 C23C16/32
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