| 摘要 |
A resist resin has a molecular structure in which protecting groups bond to a base resin such that elimination of the protecting groups from the resist resin increases its alkali-solubility. The protecting groups are residual groups represented by the following formula (I): represents a substituted or unsubstituted, fused ring having 12 to 25 carbon atoms, and R represents an alkyl group having 1 to 4 carbon atoms. The resist resin is excellent in etch resistance, resist resolution and substrate adhesion and also in various other properties required for resist resins.
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