| 摘要 |
PURPOSE: A dry etcher is provided to prevent generation of spots in an etch process and to improve productivity, by forming a cooling unit corresponding to the front surface of a lower electrode and by uniformly and rapidly controlling the temperature of the lower electrode while using gas as coolant. CONSTITUTION: An upper electrode is positioned inside a chamber. A target material is settled in the lower electrode(110) separated from the upper electrode. The cooling unit(120) of which the inside is filled with coolant is installed inside the lower electrode, corresponding to the front surface of the lower electrode. A gas introducing unit introduces gas of a plasma state to the inside of the chamber, installed between the upper and lower electrodes. An exhaust unit(142) exhausts the air inside the chamber. A power supplying unit is connected to the upper and lower electrodes. A temperature control unit(160) controls the temperature of the coolant, connected to the cooling unit.
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