| 摘要 |
A plasma treatment device (1) of parallel flat plate type, wherein a baffle plate (24) for enclosing plasma in a plasma generating area above a chamber is formed of a plurality of plate members (25) stuck on each other, the plate members (25) are bent in a specified pattern, and, for example, hexagonal holes (24a) are formed between the plate members (25) adjacent to each other, whereby the baffle plate (24) can have a large number of honeycomb-shaped holes (24a) on the entire area thereof.
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