| 摘要 |
PURPOSE: An ether compound, a polymer compound, a resist material containing the polymer compound and a method for forming pattern using the resist material are provided, to improve sensitivity, resolution and etching resistance of the resist material. CONSTITUTION: The ether compound is represented by the formula 1. The polymer compound contains the repeating unit represented by the formula 1-1 or 1-2, and has a mass average molecular weight of 1,000-500,000. In the formulas 1, 1-1 and 1-2, R1 is H or a straight, branched or cyclic alkyl group of C1-C6; R2 is a straight, branched or cyclic alkyl group of C1-C6; R3 is H, an acyl group of C1-C15 or an alkoxycarbonyl group, wherein some or all hydrogens of the groups can be substituted with halogens; k is 0 or 1; m is an integer of 0-3; and n is an integer of 3-6.
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